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Process technology to integrate polycrystalline uncooled PbSe infrared detectors on interference filters

机译:将多晶未冷却PbSe红外探测器集成到干涉滤光片上的工艺技术

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A technology to process uncooled polycrystalline PbSe IR detectors on interference filters has been developed. Thus, the lead salt natural spectral response can be modified as required. PbSe is deposited, processed and sensitized, following a unique method, on an interference filter made up of a sapphire or silicon substrate and a Ge/SiO multilayer structure. Unlike standard polycrystalline PbSe processing methods, we deposit PbSe by sublimation in vacuum. As-deposited, PbSe is not sensitive to infrared light. In order to turn it photosensitive it is necessary to expose the films to specific thermal treatments. We have developed a very efficient sensitization process during which substrates are submitted to temperatures as high as 450℃. In this work we demonstrate that we are able to process a PbSe detector directly on top of an interference filter. Also, we present preliminary results regarding the compatibility of our technology with standard photolithography and dry etch techniques. Results obtained pave the way for the development of uncooled multicolor medium-wave infrared detectors.
机译:已经开发了一种在干涉滤光片上处理未冷却的多晶PbSe红外探测器的技术。因此,可以根据需要修改铅盐的自然光谱响应。按照独特的方法,在由蓝宝石或硅衬底和Ge / SiO多层结构组成的干涉滤光片上沉积,处理和敏化PbSe。与标准多晶PbSe处理方法不同,我们通过在真空中升华来沉积PbSe。沉积时,PbSe对红外光不敏感。为了使其变为光敏性,必须将膜暴露于特定的热处理中。我们已经开发了一种非常有效的敏化工艺,在此过程中,基材会经受高达450℃的温度。在这项工作中,我们证明了我们能够直接在干扰滤波器的顶部处理PbSe检测器。此外,我们还提供了有关我们的技术与标准光刻和干蚀刻技术的兼容性的初步结果。获得的结果为未冷却的多色中波红外探测器的开发铺平了道路。

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