Yield-aware Decomposition for LELE Double Patterning

摘要

In this paper, we propose a fast layout decomposition algorithm in litho-etch-litho-etch (LELE) type double patterning considering the yield. Our proposed algorithm extracts stitch candidates properly from complex layouts including various patterns, line widths and pitches. The planarity of the conflict graph and independence of stitch-candidates are utilized to obtain a layout decomposition with minimum cost efficiently for higher yield. The validity of our proposed algorithm is confirmed by using benchmark layout patterns used in literatures as well as layout patterns generated to fit the target manufacturing technologies as much as possible. In our experiments, our proposed algorithm is 7.7 times faster than an existing method on average.