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Effect of shallow donors induced by hydrogen on P~+N junctions

机译:氢诱导浅施主对P〜+ N结的影响

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We have evaluated the effect of shallow donors induced by proton irradiation on P~+N junctions. We have combined the capacitance-voltage (C-V) technique, which provides the shallow donor profile, and a numerical simulation, based on the solution of Poisson's equation, to determine the electric field as a function of depth in the N region. This procedure can be applied to study the breakdown voltage of P~+N junctions as a function of proton irradiation, i.e. its energy and dose. direct c 1999 Elsevier Science S.A. All rights reserved.
机译:我们已经评估了质子辐照引起的浅施主对P〜+ N结的影响。我们结合了电容电压(C-V)技术(可提供浅的施主轮廓)和基于Poisson方程解的数值模拟,以确定电场与N区深度的关系。该程序可用于研究P〜+ N结的击穿电压与质子辐射的关系,即其能量和剂量。直接c 1999 Elsevier Science S.A.保留所有权利。

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