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Effect of shallow donors induced by hydrogen on P~+N junctions

机译:氢氢诱导施用对P〜+ n结的影响

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We have evaluated the effect of shallow donors induced by proton irradiation on P~+N junctions. We have combined the capacitance-voltage (C-V) technique, which provides the shallow donor profile, and a numerical simulation, based on the solution of Poisson's equation, to determine the electric field as a function of depth in the N region. This procedure can be applied to study the breakdown voltage of P~+N junctions as a function of proton irradiation, i.e. its energy and dose. direct c 1999 Elsevier Science S.A. All rights reserved.
机译:我们已经评估了质子辐射诱导的浅供体对P〜+ n结的影响。我们已经组合了提供浅供体概况的电容 - 电压(C-V)技术,以及基于泊松等式的解决方案的数值模拟,以确定电场作为N区域的深度的函数。可以应用该程序以研究P〜+ N个结的击穿电压作为质子辐射的功能,即其能量和剂量。直接C 1999 Elsevier Science S.A.保留所有权利。

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