Illumination Optics Design for EUV-Lithography

摘要

The demanding performance of optical systems for EUV lithography requires new and innovative solutions for the illumination optics design. The illuminato ris one of the key components for EUV-lithography. It has to provide uniform illumination across the arc-shaped field and to comply with the telecentricity requirements of the projection lens. The illuminator has to be adapted to size and divergence fo an EUV source. The constraint of minimizing the number of optical elements is compensated for by enhancing the complexity of single optical elements, which in turn challenges fabrication.