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Conference on soft x-ray and EUV imaging systems

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1.Portable diagnostics for EUV light sources

机译：EUV光源的便携式诊断
- 作者：R. Stuik;R. Constantinescu;P. Hegeman;J. Jonkers;H.F. Fledderus;V. Banine;F. Bijkerk;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- EUV;
- source;
- lithography;
- EUV diagnostics;
2.Present Status of the ASET At-Wavelength Phase-Shifting Point Diffraction Interferometer

机译：ASET在波长相移点衍射干涉仪的现状状态
- 作者：Katsumi Sugisaki;Yucong Zhu;Yoshio Gomei;Masahito Niibe;Takeo Watanabe;Hiroo Kinoshita;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- optical testing;
- interferometry;
- phase-shifting point diffraction interferometer;
- EUV lithography;
3.Multilayer reflectance during exposure to EUV radiation

机译：在暴露于EUV辐射期间的多层反射率
- 作者：Sebastian Oestreich;Roman Klein;Frank Scholze;Jeroen Jonkers;Eric Louis;Andrey Yakshin;Peter Gorts;Gerhard Ulm;Markus Haidl;Fred Bijkerk;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- extreme ultraviolet lithography;
- EUV optics;
- surface contamination;
- multilayer mirrors;
- hydrocarbon contamination;
- ozone cleaning;
4.Varied-line-spacing laminar-type holographic grating for the standard soft X-ray flat-field spectrograph

机译：用于标准软X射线平场光谱仪的各种线间距层状全息光栅
- 作者：Masato Koike;Takeshi Namioka;Eric Gullikson;Yoshihisa Harada;Sadayuki Ishikawa;Takashi Imazono;Stanley Mrowka;Noboru Miyata;Mihiro Yanagihara;James H. Underwood;Kazuo Sano;Tokuo Ogiwara;Osamu Yoda;Shiro Nagai;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- diffraction grating;
- holographic grating;
- diffraction efficiency;
- spectrometer;
- flat-field spectrograph;
- soft x-ray;
5.The design, fabrication and characterization of broadband multilayer mirrors for EUV optics at normal incidence

机译：正常发病率的EUV光学宽带多层镜的设计，制造与表征
- 作者：Zhanshan Wang;Changjun Kun;Yueying Ma;Bin Chen;Jianlin Cao;Zhuying Zhou;Xingdan Chen;Alan G. Michette;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- broadband multilayer;
- EUV optics;
6.Extreme ultraviolet source development: A comparison of different concepts

机译：极端紫外源开发：不同概念的比较
- 作者：G. schriever;M. Rahe;U. Rebhan;D. Basting;W. J. Walecki;H. Lauth;R. Lebert;K. Bergmann;D. Hoffmann;O. Rosier;W. Neff;R. Poprawe;R. Sauerbrey;H. Schwoerer;S. Dusterer;C. Ziener;P. Nickles;H. Stiehl;I. Will;W. Sandner;G. Schmahl;D. Rudolph;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- extreme ultraviolet;
- EUV source;
- gas discharge source;
- Z-pinch;
- laser produced plasma;
7.High precision measurements of the groove density of diffraction gratings

机译：高精度测量衍射光栅的凹槽密度
- 作者：Daniele Cocco;Rudi Sergo;Giovanni Sostero;Marco Zangrando;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- LTP;
- VLS gratings;
- grating metrology;
- groove density;
8.Si-based multilayers with high thermal stability

机译：基于SI的多层热稳定性
- 作者：N. Kaiser;S. Yulin;T. Feigl;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- Mo/Si;
- Mo_2C/Si;
- Mo/Mo_2C/Si/Mo_2C;
- multilayers;
- magnetron sputtering;
- thermal stability;
- NIR;
- EUVl;
9.Illumination Optics Design for EUV-Lithography

机译：EUV光刻的照明光学设计
- 作者：Martin Antoni;Wolfgang Singer;Jorg Schultz;Johannes Wangler;Isabel Escudero-Sanz;Bob Kruizinga;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- EUV lithography;
- illumination optics;
- etendue;
- fly's-eye condenser;
- conical reflection;
10.Optical layout of BACH: a Beamline for Advanced diCHrosim at ELETTRA

机译：Bach的光学布局：Elettra的高级Dichrosim的光束线
- 作者：M. Zangrando;M. Finazzi;F. Parmigiani;G. Paolucci;D. Cocco;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- synchrotron radiation;
- soft x-ray optics;
- beamline design;
- monochromator;
11.The new PTB beamlines for high-accuracy EUV reflectometry at BESSY II

机译：Bessy II的高精度EUV反射测量仪的新PTB波束线
- 作者：J. Weser;F. Scholze;B. Beckhoff;G. Brandt;R. Fliegauf;R. Klein;B. Meyer;D. Rost;D. Schmitz;M. Veldkampl;G. Ulm;E. Louis;A. E. Yakshin;S. Oestreich;F. Bijkerk;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
12.DUV or EUV, that is the question

机译：duv或euv，这是问题
- 作者：David M. Williamson;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- microlithography;
- DUV;
- EUV;
- optical design;
- diffraction;
- limited;
- catadioptric;
- catoptric;
- dioptric;
13.Optimization of air gap for two-dimensional imaging system using synchrotron radiation

机译：使用同步辐射的二维成像系统空气隙优化
- 作者：Tsutomu Zeniya;Tohoru Takeda;Quanwen Yu;Kazuyuki Hyodo;Tetsuya Yuasa;Yuji Aiyoshi;Yukio Hiranaka;Yuji Itai;Takao Akatsuka;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- air gap;
- synchrotron radiation;
- scattered x-ray;
- two-dimensional x-ray imaging;
- image quality;
14.Trends in Optical Design of Projection lenses for UV-and EUV-Lithography

机译：用于UV和EUV光刻的投影镜片光学设计的趋势
- 作者：Willi Ulrich;Susanne Beiersdorfer;Hans-Jurgen Mann;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- lens design;
- optical systems;
- microlithography;
- UV;
- EUV;
15.Mirror substrates for EUV-lithography: progress in metrology and optical fabrication technology

机译：用于EUV光刻的镜子基板：计量和光学制造技术的进展
- 作者：U. Dinger;F. Eisert;H. Lasser;M. Mayer;A. Seifert;G. seitz;S. Stacklies;F.-J. Stickel;M. Weiser;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
16.A laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry

机译：用于极端紫外光刻和波长干扰法的激光产生的水等离子体源
- 作者：Raluca C. Constantinescu;Jeroen Jonkers;Petra Hegeman;Matthieu Visser;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- EUV lithography;
- laser-geenrated plasma;
- plasma characterisation;
- EUV optics contamination;
17.Mo/Si multilayer coating technology for EUVL, coating uniformity and time stability

机译：用于EUVL的MO / SI多层涂层技术，涂层均匀性和时间稳定性
- 作者：E. Louis;A.E. Yakshin;P.C. Gorts;S. Oestreich;E.L.G. Maas;M.J.h. Kessels;D. Schmitz;F. Scholze;G. Ulm;S. Mullender;F. Bijkerk;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- Mo/Si multilayer coatings;
- normal-incidence reflectivity;
- electron-beam deposition;
- EUVL;
18.Compact debris shutter design of a laser-produced plasma source for high NA application

机译：紧凑型碎片快门设计的激光产生的等离子体源用于高NA应用
- 作者：Masaki Yamamoto;Minaji Furudate;Norio Sato;Hiroshi Takagi;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- debris shutter;
- laser produced plasma source;
- extreme ultraviolet light;
- high numerical aperture;
19.High Resolution Soft X-ray Microscopy

机译：高分辨率软X射线显微镜
- 作者：Weilun Chao;Erik H. Anderson;Gregory Denbeaux;Bruce Harteneck;Mark Le Gros;Angelic L. Pearson;Deirdre Olynick;David Attwood;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- x-ray microscope;
- XM-1;
- zone plate;
- resolution;
20.XM-1, the high-rsolution soft x-ray microscope at the Advanced Light Source

机译：XM-1，高分辨率软X射线显微镜处于先进的光源
- 作者：Angelic L. Pearson;Weilun Chao;Gregory Denbeaux;Thomas Eimuller;Peter Fischer;Lewis Johnson;Matthias Koehler;Carolyn Larabell;Mark Le Gros;Deborah Yager;David Attwood;SPIE-The International Society for Optical Engineering
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- x-ray microscope;
- XM-1;
- spatial resolution;
- X-MCD;
- magnetic imaging;
- computer processing;
21.XM-1, the high-resolution soft x-ray microscope at the Advanced Light Source

机译：XM-1，高分辨率软X射线显微镜处于先进的光源
- 作者：Angelic L. Pearson;Weilun Chao;Gregory Denbeaux;Thomas Eimuller;Peter Fischer;Lewis Johnson;Matthias Koehler;Carolyn Larabell;Mark Le Gros;Deborah Yager;David Attwood
- 会议名称：《Conference on soft x-ray and EUV imaging systems》 | 2000年
- x-ray microscope;
- XM-1;
- spatial resolution;
- X-MCD;
- magnetic imaging;
- computer processing;