High aspect ratio neural probes for monolithic integration with ultra- low power CMOS operational amplifier circuit

摘要

A microprobe array for recording neural signals has been designed and fabricated for future monolithic integration with an ultra-low power CMOS operational amplifier circuit on a 2 mm x 2 mm chip. A LIGA-like process is employed utilizing UV lithography and electrodeposition techniques. Probes are fabricated on silicon substrate. The fabrication process is compatible with monolithic integration with CMOS signal processing circuitry. The probes are 210 μm high and have an aspect ratio 3:1. Comments are made on processing issues related to chip-level monolithic integration.