首页> 外文会议>Conference Series no.184; International Symposium on Compound Semiconductors; 20040912-16; Seoul(KR) >Improved Breakdown Voltage and Output Conductance Characteristics of GaAs pHEMTs using Composite Gate fabricated by Digital Recess Method
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Improved Breakdown Voltage and Output Conductance Characteristics of GaAs pHEMTs using Composite Gate fabricated by Digital Recess Method

机译:使用数字凹进方法制造的复合栅极改善了GaAs pHEMT的击穿电压和输出电导特性

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摘要

In this paper, we report a new technique to enhance breakdown voltages and output conductances of AlGaAs/InGaAs/GaAs pHEMTs. This structure used field plate (FP) in the form of composite gate. Composite gate was fabricated using digital recess method. A breakdown voltage of a single gate device was 6.4V and output conductances were 17mS/mm. The proposed structure with composite gate achieved 9.8 V breakdown voltage and 5.5 mS/mm output conductances.
机译:在本文中,我们报告了一种提高AlGaAs / InGaAs / GaAs pHEMTs的击穿电压和输出电导的新技术。这种结构使用了复合栅极形式的场板(FP)。复合门是用数字凹槽法制造的。单栅极器件的击穿电压为6.4V,输出电导为17mS / mm。所提出的具有复合栅极的结构实现了9.8 V击穿电压和5.5 mS / mm的输出电导。

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