首页> 外文会议>Conference on Photon Processing in Microelectronics and Photonics; 20080121-24; San Jose,CA(US) >Surface microstructures of silica glass by laser-induced backside wet etching
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Surface microstructures of silica glass by laser-induced backside wet etching

机译:激光诱导背面湿法刻蚀石英玻璃的表面微观结构

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摘要

We have investigated a one-step method to fabricate a microstructure on a silica glass plate using laser-induced backside wet etching (LIBWE) upon irradiation with DPSS (diode-pumped solid state) lasers. Well-defi ned deep microtrenches without crack formations on a fused silica glass plate were fabricated by LIBWE method. As the laser beam of DPSS UV laser at a high repetition rate up to 5 - 100 kHz is scanned on the sample surface with the galvanometer controlled by a computer for flexible operations, galvanometer-based point scanning system is suitable for a rapid prototyping process according to electronic design data in the computer. The behavior of liquid ablation (explosive vaporization) was monitored by impulse pressure detection with a fast-response piezoelectric pressure gauge. LIBWE method is suitable for rapid prototyping and rapid manufacturing of surface microstructuing of silica glass as mask-less exposure system in a conventional atmospheric environment.
机译:我们研究了一种一步法,在用DPSS(二极管泵浦固态)激光器照射时,使用激光诱导的背面湿法刻蚀(LIBWE)在二氧化硅玻璃板上制造微结构。通过LIBWE方法在熔凝石英玻璃板上定义了清晰的深沟槽,没有裂纹形成。由于使用计算机控制的振镜以高重复率高达5-100 kHz的高重复频率的DPSS UV激光束在样品表面上进行扫描,因此操作灵活,基于振镜的点扫描系统适用于快速成型的过程计算机中的电子设计数据。液体消融(爆炸性汽化)的行为通过使用快速响应压电压力计的脉冲压力检测进行监控。 LIBWE方法适用于在常规大气环境中作为无掩模曝光系统的二氧化硅玻璃的快速成型和表面微结构的快速制造。

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