首页> 外文会议>Conference on Nanomaterials and Their Optical Applications; Aug 5-7, 2003; San Diego, California, USA >Luminescence of nanostructured Y_2O_3:Eu thin films fabricated using glancing angle deposition techniques
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Luminescence of nanostructured Y_2O_3:Eu thin films fabricated using glancing angle deposition techniques

机译:使用掠角沉积技术制备的纳米结构Y_2O_3:Eu薄膜的发光

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Thin films of europium-doped yttrium oxide (Y_2O_3:Eu), a well-known luminescent material, were grown using electron beam evaporation, in combination with the Glancing Angle Deposition (GLAD) technique. GLAD makes use of controlled substrate motion during physical vapour deposition (PVD), resulting in a high degree of control over the nanostructure of the film. Until recently GLAD had not been used with luminescent materials. Films were deposited using pre-doped Y_2O_3:Eu source material, with either 4.0% (wt) Eu doping or 5.6% (wt) Eu doping. The nanostructure of these films was characterized through scanning electron microscopy, while the light emission properties of these films was characterized by photoluminescence measurements. In order to optimize the light emission properties of the films the partial pressure of oxygen during the deposition of the films was varied. Films were deposited on both silicon and sapphire substrates, in order to compare how different substrates affect the growth and light emission of the films.
机译:结合electron角沉积(GLAD)技术,使用电子束蒸发法生长了-掺杂的氧化钇(Y_2O_3:Eu)薄膜,这是一种著名的发光材料。 GLAD在物理气相沉积(PVD)过程中利用了受控的基材运动,从而高度控制了薄膜的纳米结构。直到最近,GLAD还没有用于发光材料。使用预掺杂的Y_2O_3:Eu源材料沉积薄膜,掺杂的4.0%(wt)的Eu或5.6%(wt)的Eu掺杂。这些膜的纳米结构通过扫描电子显微镜表征,而这些膜的发光性质通过光致发光测量表征。为了优化膜的发光特性,在膜沉积期间改变氧气的分压。薄膜沉积在硅和蓝宝石衬底上,以比较不同的衬底如何影响薄膜的生长和发光。

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