首页> 外文会议>Conference on MOEMS and Miniaturized Systems; 20080122-23; San Jose,CA(US) >Micromirrors for multiobject spectroscopy: optical and cryogenic characterization
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Micromirrors for multiobject spectroscopy: optical and cryogenic characterization

机译:多目标光谱微镜:光学和低温表征

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We are developing micromirror arrays (MMA) for future generation infrared multiobject spectroscopy (MOS) requiring cryogenic environment. So far we successfully realized small arrays of 5 × 5 single-crystalline silicon micromirrors. The 100μm × 200μm micromirrors show excellent surface quality and can be tilted by electrostatic actuation yielding 20° mechanical tilt-angle. An electromechanical locking mechanism has been demonstrated that provides uniform tilt-angle within one arc minute precision over the whole array. Infrared MOS requires cryogenic environment and coated mirrors, silicon being transparent in the infrared. We report on the influence of the reflective coating on the mirror quality and on the characterization of the MMA in cryogenic environment. A Veeco/Wyko optical profiler was used to measure the flatness of uncoated and coated mirrors. The uncoated and unactuated micromirrors showed a peak-to-valley deformation (PTV) of below 10nm. An evaporated 10nm chrome/50nm gold coating on the mirror increased the PTV to 35nm; by depositing the same layers on both sides of the mirrors the PTV was reduced down to 17nm. Cryogenic characterization was carried out on a custom built interferometric characterization bench onto which a cryogenic chamber was mounted. The chamber pressure was at 10e-6 mbar and the temperature measured right next to the micromirror device was 86K. The micromirrors could be actuated before, during and after cryogenic testing. The PTV of the chrome/gold coated mirrors increased from 35nm to 50nm, still remaining in the requirements of < lambda/20 for lambda=1μm.
机译:我们正在为需要低温环境的下一代红外多目标光谱(MOS)开发微镜阵列(MMA)。到目前为止,我们已经成功实现了5×5单晶硅微镜的小阵列。 100μm×200μm的微镜具有出色的表面质量,并且可以通过静电驱动使其倾斜,从而产生20°的机械倾斜角。已经证明了一种机电锁定机制,该机制可在整个阵列上以一弧分钟的精度提供均匀的倾斜角度。红外MOS需要低温环境和涂层镜,硅在红外中是透明的。我们报告了反射涂层对镜面质量的影响以及在低温环境下MMA的表征。使用Veeco / Wyko光学轮廓仪测量未镀膜和镀膜镜的平面度。未镀膜且未激活的微镜显示出低于10nm的峰谷变形(PTV)。反射镜上蒸发的10nm铬/ 50nm金涂层将PTV增大到35nm。通过在镜子的两面都沉积相同的层,PTV减小到了17nm。低温表征是在定制的干涉仪表征工作台上进行的,低温工作台安装在该工作台上。腔室压力为10e-6 mbar,紧挨着微镜设备测得的温度为86K。可以在低温测试之前,期间和之后启动微镜。镀铬/镀金反射镜的PTV从35nm增加到50nm,对于λ=1μm仍保持<λ/ 20的要求。

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