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Arrays of High Tilt-Angle Micromirrors for Multiobject Spectroscopy

机译:高倾斜角微镜的多目标光谱阵列

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Micromirror arrays are promising components for generating reflective slit masks in future multiobject spectrographs. The micromirrors, 100 mum times200 mum in size, are etched in bulk single crystal silicon, whereas a hidden suspension is realized by surface micromachining. The micromirrors are actuated electrostatically by electrodes located on a second chip. The use of silicon on insulator (SOI) wafers for both mirror and electrode chip ensures thermal compatibility for cryogenic operation. A system of multiple landing beams has been developed, which latches the mirror at a well-defined tilt angle when actuated. Arrays of 5times5 micromirrors have been realized. The tilt angle obtained is 20deg at a pull-in voltage of 90 V. Measurements with an optical profiler showed that the tilt angle of the actuated and locked mirror is stable with a precision of 1 arcmin over a range of 15 V. This locking system makes the tilt angle independent from process variations across the wafer and, thus, provides uniform tilt angle over the whole array. The surface quality of the mirrors in actuated state is better than 10-nm peak to valley and the local roughness is about 1-nm root mean square
机译:微镜阵列是在未来的多目标光谱仪中产生反射狭缝掩模的有希望的组件。在块状单晶硅中蚀刻尺寸为100微米乘以200微米的微镜,而通过表面微加工实现隐藏的悬浮。微镜由位于第二芯片上的电极静电驱动。对于反射镜和电极芯片,使用绝缘体上硅(SOI)晶圆可确保低温操作的热兼容性。已经开发了一种具有多个着陆光束的系统,该系统在致动时以明确限定的倾斜角锁定镜子。已经实现了5×5微镜阵列。在90 V的引入电压下,获得的倾斜角为20度。使用光学轮廓仪进行的测量表明,在15 V的范围内,被致动并锁定的反射镜的倾斜角稳定,精度为1 arcmin。使倾斜角与整个晶片上的工艺变化无关,从而在整个阵列上提供均匀的倾斜角。处于激活状态的反射镜的表面质量优于峰谷至10nm,局部粗糙度约为1nm均方根

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