首页> 外文会议>Conference on Micro- and Nanoelectronics; 20031006-20031010; Zvenigorod; RU >Magnetic properties of direct current magnetron sputtered thin nickel films
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Magnetic properties of direct current magnetron sputtered thin nickel films

机译:直流磁控溅射镍薄膜的磁性

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The structure and magnetic properties of thin nickel films grown by direct current magnetron sputtering on GaAs(100) and Si(111) substrates were studied by means of ferromagnetic resonance (FMR) method, magnetooptic Kerr effect (MOKE), atomic force microscopy (AFM) and X-ray diffraction (XRD). Dependence of the properties on substrate location inside flame zone during deposition was shown. Possibility of changing of the films' texture by varying of potential of the substrate during deposition was shown.
机译:利用铁磁共振(FMR),磁光克尔效应(MOKE),原子力显微镜(AFM)研究了直流磁控溅射在GaAs(100)和Si(111)衬底上生长的镍薄膜的结构和磁性。 )和X射线衍射(XRD)。显示了在沉积过程中性质对火焰区域内的基底位置的依赖性。示出了在沉积期间通过改变衬底的电势来改变膜的质地的可能性。

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