首页> 外文会议>Conference on MEMS adaptive optics III; 20090127-29; San Jose, CA(US) >Demonstration of a symmetric dark hole with a stroke-minimizing correction algorithm
【24h】

Demonstration of a symmetric dark hole with a stroke-minimizing correction algorithm

机译:用最小行程校正算法演示对称黑洞

获取原文
获取原文并翻译 | 示例

摘要

The past decade has seen a significant growth in research targeted at space based observatories for imaging exosolar planets. The challenge is in designing an imaging system for high-contrast. Even with a perfect coronagraph that modifies the point spread function to achieve high-contrast, wavefront sensing and control is needed to correct the errors in the optics and generate a "dark hole". The high-contrast imaging laboratory at Princeton University is equipped with two Boston Micromachines Kilo-DMs. We review here an algorithm designed to achieve high-contrast on both sides of the image plane while minimizing the stroke necessary from each deformable mirror (DM). This algorithm uses the first DM to correct for amplitude aberrations and the second DM to create a flat wavefront in the pupil plane. We then show the first results obtained at Princeton with this correction algorithm, and we demonstrate a symmetric dark hole in monochromatic light.
机译:在过去的十年中,针对空间观测台观测太阳系外行星成像的研究有了显着增长。挑战在于设计高对比度的成像系统。即使使用完美的日冕仪可以修改点扩散功能以实现高对比度,也需要进行波前传感和控制,以校正光学系统中的误差并产生“黑洞”。普林斯顿大学的高对比度成像实验室配备了两个Boston Micromachines Kilo-DM。我们在这里回顾一种算法,该算法旨在在图像平面的两侧实现高对比度,同时最大程度地减少每个可变形反射镜(DM)所需的笔划。该算法使用第一个DM校正振幅像差,使用第二个DM在光瞳平面中创建平坦的波前。然后,我们显示使用该校正算法在普林斯顿获得的第一个结果,并证明了单色光中的对称暗孔。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号