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AFM Scanning Moire Method for Nano-Deformation Measurement

机译:原子力显微镜扫描莫尔条纹法的纳米变形测量

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In this study, the atomic force microscope(AFM) scanning moire method is develoepd. The scanning lines in the AFM monitor are used as the reference grating. The reference grating interferes with the specimen grating, and forms a moire pattern ont eh monitor. The formation mechanism of AFM moire, the deformation measurement principle using this mehtod are described in detail. The AFM scanning moire method is used to measure the residual deformation of mica substrate after being damaged by the YAG laser, and the thermal deformation in a QFP type electronic package. The experiment results verify the feasibility of AFM scanning moire method and show its ability to measure the in-plane deforamtion in both micro-and nano-scales.
机译:在这项研究中,原子力显微镜(AFM)扫描莫尔方法是可发展的。 AFM监视器中的扫描线用作参考光栅。参考光栅会干扰样品光栅,并在监视器上形成莫尔条纹。详细介绍了AFM云纹的形成机理,使用该方法的变形测量​​原理。 AFM扫描莫尔条纹法用于测量YAG激光损坏后的云母基板残余变形以及QFP型电子封装中的热变形。实验结果验证了AFM扫描莫尔条纹法的可行性,并显示了其在微米和纳米尺度上测量面内变形的能力。

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