首页> 外文会议>Conference on High-Power Gas Lasers; 20030630-20030704; St.Petersburg; RU >Recent advances in the development of coherent and incoherent UV and EUV discharge sources
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Recent advances in the development of coherent and incoherent UV and EUV discharge sources

机译:相干和不相干UV和EUV放电源开发的最新进展

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摘要

We report on the experimental status of the development of compact high power ( up to 500 W) high repetition rate (up to 6 kHz) excimer lasers and discharge produced plasma sources radiating in an extreme ultraviolet (EUV) region. EUV power more than 70 W (around 13.5 nm wavelength, a bandwidth of 2%) into 2π sr at 1250 Hz was obtained for continuous operation of a source.
机译:我们报告了紧凑型高功率(高达500 W),高重复频率(高达6 kHz)准分子激光器的发展以及将产生的等离子体源辐射到极紫外(EUV)区域的实验结果。获得了1250 Hz时2πsr的70瓦以上的EUV功率(约13.5 nm波长,带宽为2%的带宽),以使光源连续工作。

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