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Pulsed laser ablation mechanisms of thin metal films

机译:金属薄膜的脉冲激光烧蚀机理

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Abstract: The ablation of thin films by single laser pulse is a well known technique with widespread industrial applications. Ablation occurs in a well defined power density region if a supported thin film is illuminated by a single laser pulse. In the literature there are a number of theoretical description of ablation, but a very few based on in-situ experiments. In our study we have directly visualized the ablation processes with fast photography based on application of dye laser probe pulses. The ablation of chromium and tungsten layers supported onto glass substrates with pulses of ArF excimer laser was investigated. The ablated area was illuminated by a delayed short pulse of a fluorescein dye laser or a Rhodamine6G dye laser. Snapshots of initial phase of ablation and the forthcoming material transport were recorded by an optical system and a video camera. Blowing-off mechanisms and thermo-mechanical mechanisms are considered to take place during ablation. Pressures formed during laser ablation were calculated and compared with experimental data. It was found that thermo- desorption of gas adsorbed on to the substrate surface, substrate materials evaporation and film exfoliation by its longitudinal thermal enlargement may be acting during laser ablation of thin films.!10
机译:摘要:单激光脉冲烧蚀薄膜是一种众所周知的技术,在工业上得到广泛应用。如果被支撑的薄膜被单个激光脉冲照射,则烧蚀会在明确定义的功率密度区域内发生。在文献中,有许多关于消融的理论描述,但很少有基于原位实验的描述。在我们的研究中,我们基于染料激光探针脉冲的应用,通过快速摄影直接观察了消融过程。研究了用ArF准分子激光脉冲对玻璃基板上铬和钨层的烧蚀。通过荧光素染料激光或若丹明6G染料激光的延迟短脉冲照射消融区域。消融初始阶段和即将进行的材料传输的快照由光学系统和摄像机记录。吹气机制和热力机制被认为是在消融过程中发生的。计算激光烧蚀过程中形成的压力,并将其与实验数据进行比较。已发现,在激光烧蚀薄膜过程中,吸附在基材表面的气体的热脱附,基材材料的蒸发以及由于其纵向热膨胀而引起的薄膜剥落可能是起作用的!10

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