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Processing, Properties and Possible Applications of PZT-Based Thin Films

机译:PZT基薄膜的加工,性能及可能的应用

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摘要

The radio frequency (RF) sputtering method was utilized to grow PZT-based ferroelectric thin films with the chemical composition Pb(Zr_(0.53)Ti_(0.45)W_(0.01)Cd_(0.01)O_3). The thin films were characterized in terms of their microstructure, crystalline structure, chemical composition and dielectric properties. The processing conditions diagram was defined, which ensured conservation of stoichiometry of the chemical composition of the thin films. Complex impedance spectroscopy was used to measure frequency-dependent dielectric properties of the PZT-type thin films. Great application potential of the PZT-based thin films was considered and possibility to employ as-obtained PZT thin films as active elements of the piezoelectric sensors was reported.
机译:利用射频(RF)溅射法生长了化学成分为Pb(Zr_(0.53)Ti_(0.45)W_(0.01)Cd_(0.01)O_3)的PZT基铁电薄膜。薄膜的特征在于其微观结构,晶体结构,化学组成和介电性能。定义了工艺条件图,以确保保持化学计量的薄膜化学组成。复数阻抗谱用于测量PZT型薄膜的频率相关介电特性。考虑了基于PZT的薄膜的巨大应用潜力,并且报道了将获得的PZT薄膜用作压电传感器的有源元件的可能性。

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