Wafer Scale Processing of Plasmonic Nanoslit Arrays in 200mm CMOS Fab Environment

摘要

Plasmonic nanoslits have great potential for single molecule applications. We report a wafer scale process for these structures using process steps compatible with a standard CMOS fab environment. This process allows a large scale fabrication of designed nanoslits with extremely small gap sizes and lengths tuned to exhibit optical resonances. Moreover, adjacent grating nano-antennas were successfully implemented, generating strong and localized electric fields in the nanoslit. These slits have practical applications in surface enhanced Raman spectroscopy-based molecular sensing and plasmonic tweezers.