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MOLECULAR DYNAMICS STUDY OF NANO-TRIBOLOGICAL PROPERTIES OF SILICON NITRIDE FILMS

机译:氮化硅薄膜的纳米摩擦学特性的分子动力学研究

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摘要

Silicon nitride films were attracting extensive research interest in the past few decades as hard disk protective coating, especially the beta-silicon nitride (β-Si3N4) films and amorphous silicon nitride (SiNx) films, which have high hardness, chemical durability and low friction coefficient properties against wear, corrosion and reducing the friction resistance, respectively. Considerable efforts have been made in studying silicon nitride. However, it s difficult to determine its nano-tribological properties experimentally since the results were affected by a lot of contact and environment conditions. The molecular dynamics (MD) simulation method is employed in this work. A rigid diamond sphere modeled as a spherical tip are sliding over a layered silicon nitride film substrate, respectively, to investigate the tribological properties of silicon nitride films. The effect of the relative sliding velocity and sliding direction, the normal force and the thickness of crystalline silicon nitride films on the friction coefficient of silicon nitride films were investigated.
机译:在过去的几十年中,氮化硅薄膜作为硬盘保护涂层引起了广泛的研究兴趣,特别是β-氮化硅(β-Si3N4)薄膜和非晶态氮化硅(SiNx)薄膜,它们具有高硬度,化学耐久性和低摩擦力分别具有抗磨损,抗腐蚀和降低摩擦阻力的系数特性。在研究氮化硅方面已经做出了相当大的努力。但是,由于实验结果受许多接触和环境条件的影响,因此很难通过实验确定其纳米摩擦学性能。在这项工作中采用了分子动力学(MD)模拟方法。建模为球形尖端的刚性金刚石球分别在层状氮化硅膜基板上滑动,以研究氮化硅膜的摩擦学性能。研究了相对滑动速度和滑动方向,结晶氮化硅膜的法向力和厚度对氮化硅膜摩擦系数的影响。

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