首页> 外文OA文献 >Molecular dynamics studies of the bonding properties of amorphous silicon nitride coatings on crystalline silicon
【2h】

Molecular dynamics studies of the bonding properties of amorphous silicon nitride coatings on crystalline silicon

机译:非晶氮化硅涂层在晶体硅上的键合特性的分子动力学研究

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

In this paper we present molecular dynamics simulations of silicon nitride, both in bulk and as an interface to crystalline silicon. We investigate, in particular, the bonding structure of the silicon nitride and analyze the simulations to search for de- fective geometries which have been identified as potential charge carrier traps when silicon nitride forms an interface with silicon semiconductors. The simulations reveal how the bonding patterns in silicon nitride are dependent upon the stoichiometry of the system. Furthermore we demonstrate how having an “interphase”, where the nitrogen content in silicon gradually reduces towards pure silicon across a boundary region, as opposed to an interface where there is an abrupt drop in nitrogen con- centration at the boundary, can result in significantly different numbers of certain important carrier trap
机译:在本文中,我们介绍了氮化硅的分子动力学模拟,无论是本体的还是晶体硅的界面。我们特别研究了氮化硅的键合结构,并分析了模拟,以寻找有缺陷的几何形状,这些缺陷在氮化硅与硅半导体形成界面时已被识别为潜在的载流子陷阱。仿真揭示了氮化硅中的键合模式如何取决于系统的化学计量。此外,我们证明了具有“中间相”的情况,其中界面中的氮含量急剧下降的界面与界面上的氮含量突然下降的界面相反,硅的氮含量在整个边界区域逐渐向纯硅降低。不同数量的某些重要载流子陷阱

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号