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Fine tuning APC concentration in REBCO coated conductors through surface modified target method

机译:通过表面改性靶方法微调REBCO涂层导体中的APC浓度

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Increased critical current density in higher applied magnetic fields is highly desired for REBCO thin films on textured substrates for widespread technological applications. Many methods have been successfully used to improve the critical current properties of REBCO films by incorporating artificial pinning centers (APCs). A novel approach for APC incorporation in REBCO films using pulsed laser deposition technique is to use surface modified target method in which a thin sectored/rectangular shaped piece of secondary phase material is attached onto the top of REBCO target using silver paste. As the target is rotated, both REBCO and APC material portions are alternatively ablated by high energy laser pulses. The advantages of this method are that the REBCO portion and APC material portion are physically separate and the APC concentration can be finely tuned by changing the size of the sectored/rectangular shaped piece of the APC material while keeping the REBCO target as the same. The fine tuning of the APC concentration is very important from the point of view of the critical current performance being critically dependent on the APC concentration as investigated recently. The schematic diagram of the surface modified target and the top view of the actual target being used are shown in figure 1.
机译:对于在广泛的技术应用中的带纹理的衬底上的REBCO薄膜,在更高的施加磁场中增加临界电流密度是非常需要的。通过并入人工钉扎中心(APC),许多方法已成功用于改善REBCO薄膜的临界电流性能。使用脉冲激光沉积技术将APC掺入REBCO薄膜的一种新方法是使用表面改性的靶材方法,其中使用银浆将细扇形/矩形的次级相材料片附着到REBCO靶材的顶部。当靶旋转时,REBCO和APC材料部分都被高能激光脉冲交替烧蚀。该方法的优点在于,REBCO部分和APC材料部分在物理上是分开的,并且可以通过更改APC材料的扇形/矩形块的大小来微调APC浓度,同时保持REBCO目标不变。从最近研究的临界电流性能关键取决于APC浓度的角度来看,APC浓度的微调非常重要。表面改性靶材的示意图和所用实际靶材的俯视图如图1所示。

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