High Value Thin Film Resistor for GaAs IC Manufacturing

摘要

An optimized thin film resistor based on a sputtered Wsix alloy has been developed. Sheet resistance of 1000 Ω/□ and a temperature coefficient of resistivity (TCR) of -650 ppm/℃ have been measured. When subjected to reliability tests, the new resistor exhibits good sheet resistance and TCR stability. Initial results from the pilot line demonstrate that this film can be integrated into a repeatable and uniform manufacturing process.