50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC)

摘要

First results obtained with IMS Nanofabrication's 50keV proof-of-concept electron multi-beam mask exposure tool(eMET POC) are presented. The eMET POC was designed from scratch to meet the requirements of the 11nm half-pitchnode and features already the sa