Integration of a Plasma Impedance Sensor and multivariate analysis to factory systems foreffective monitor reduction and fault detection

摘要

The purpose of running tool and product monitors in a fab is to limit risk to product.rnHistorically, this has been accomplished using test run such as a etch rate and measuring thernresult. Over the last decade, the automation of tool specific fault monitoring and classificationrn(FDC) has become an increasing useful tool for detecting changes in tools real time. Morernrecently, the use of multivariate analysis has distilled a wide range of information down to a morernmanageable data set. Still our challenges remain the same: to take action to limit the impactrnwhen an excursion occurs.rnThis paper outlines the use of state of the impedance monitors, and multivariate analysis with arnfocus on integration to the factory's systems. The result of integrating these methods is a systemrnhas reduced the risk of excursions and reduced the cost of monitoring. Through the use of thernintegrated system, a sharp reduction in the use of etch rate wafers is realized with considerablyrnless risk to product. The effectiveness of the integrated solution is demonstrated usingrnproduction examples.