Information and Quantum Systems Lab, Hewlett-Packard Laboratories, 1501 Page Mill Rd., Palo Alto, CA 94304, USA , Department of Physics, University of Washington, Seattle, Washington 98195, USA;
Information and Quantum Systems Lab, Hewlett-Packard Laboratories, 1501 Page Mill Rd., Palo Alto, CA 94304, USA;
Information and Quantum Systems Lab, Hewlett-Packard Laboratories, 1501 Page Mill Rd., Palo Alto, CA 94304, USA ,Institute for Quantum Information Science and Department of Physics and Astronomy, University of Calgary, Calgary, Alberta, Canada ,National Institute for Nanotechnology, Edmonton, Alberta, Canada;
Information and Quantum Systems Lab, Hewlett-Packard Laboratories, 1501 Page Mill Rd., Palo Alto, CA 94304, USA;
Element Six Ltd., King's Ride Park, Ascot, Berkshire SL5 8BP, UK;
Element Six Ltd., King's Ride Park, Ascot, Berkshire SL5 8BP, UK;
Information and Quantum Systems Lab, Hewlett-Packard Laboratories, 1501 Page Mill Rd., Palo Alto, CA 94304, USA;
机译:在(111)表面化学气相沉积金刚石生长过程中氮空位中心的完美对准和优先取向
机译:通过优先定位钻石中的氮空位中心来增强计量
机译:退火温度对SSCVD法优先非极性面取向ZnO薄膜性能的影响
机译:植入和CVD合并氮空位中心的性质:优先电荷状态和优先定位
机译:在钻石中感应围绕氮空位中心的本地充电和应变环境
机译:CVD生长钻石中的工程优先排列的氮空位中心集合体
机译:植入和结合CVD的氮空位中心的特性:优先电荷状态和优先取向