Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography

摘要

Abstract: Starting from general arguments on hexafluoroacetone chemistry, an exploratory investigation of the utility of this new type of resist chemistry is presented. The 2-hydroxyhexafluoroisopropyl- group (HHFIP) proves to be comparable to phenolic groups in respect to acidity and reactivity. Polymers containing HHFIP- moieties are high transparent alkali-soluble binder materials for functional group deprotection type, dissolution inhibition type, and crosslinking type photo resist materials. Dissolution inhibitors containing the HHFIP-function show superior inhibition properties due to strong hydrogen bond interaction with the matrix polymer. !17