Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang, 330063, China,College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China;
Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang, 330063, China;
Key Laboratory of Nondestructive Test (Chinese Ministry of Education), Nanchang Hangkong University, Nanchang, 330063, China,College of Automation Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China;
lithography; maskless lithography; SLM; DMD;
机译:基于DMD的无掩模光刻中Dammann光栅的快速原型设计
机译:基于数字微镜器件(DMD)和双面微透镜和空间滤波器阵列的无掩模光刻
机译:基于DMD的实时无掩模光刻技术制造连续浮雕微光学元件
机译:基于DMD基于无掩模光刻的地区模式生成方案
机译:利用基于图像的格式,以优化模式数据格式和掩模和掩模模式生成光刻的处理
机译:基于一步法无掩模灰度光刻的具有任意表面轮廓的微光学元件的制备
机译:基于DMD的无掩模光刻中的DAMMann光栅的快速原型设计
机译:用于可信赖的microchip生产的无掩模电子束光刻。