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Peltier Enhanced Heat Spreading for Localized Hot Spot Thermal Management

机译:Peltier增强型散热技术,用于局部热点热管理

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Localized areas of high heat flux on microprocessors are currently being identified as a dominant challenge for the thermal management community. Heat flux values up to 1 kW/cm~2 prevailing over a fraction of the overall CPU surface area create local hot spots that need to be cooled. However, thermal solutions designed for the maximum heat flux over-cool the rest of the CPU, wasting resources and creating large on-die temperature gradients. Wasting resources obviously has a negative economic and thermodynamic impact. However, it has been argued that large on-die temperature gradients reduce chip reliability and increase the difficulty in laying out the electric circuits. The current study proposes a strategy to reduce local hot spots by enhancing heat spreading through the use of the Peltier effect. The Peltier effect is most commonly associated with the operation of thermoelectric modules. In thermoelectric modules, heat is transported across the module by electrons. Ideally, the material used for the thermoelectric module would have a very low thermal conductivity to reduce the amount of back heat conduction through the thermoelectric elements, and the electric resistivity would be very low to minimize the Joule heating. Using today's best commercially available thermoelectric materials, the thermal conductivity, electric resistivity, and Seebeck coefficient are such that the COP for the thermoelectric module is on the order of 1. This implies that in order to cool a processor dissipating 100W, an additional 100W of electric power must be supplied to the thermoelectric module. A total of 200W must then be rejected by the heat sink and any building HVAC system. A more pragmatic approach is to use the Peltier effect to not cool the entire CPU, but rather only the high heat flux region. This is accomplished by placing the thermoelectric elements laterally on the backside of the CPU. The cooling junction is placed in the proximity of the high flux region, while the heating junction is placed in contact with the CPU in low heat flux area that can tolerate the additional heat, effectively creating an active heat spreader. The Peltier enhanced heat spreading proposed here is shown to provide a reduction in the temperature of a localized hot spot relative to passive heat spreading. The amount of reduction in temperature depends on the thickness of the material as well as the thermal conductivity, but values up to 50% are illustrated.
机译:当前,微处理器上高热通量的局部区域被确定为热管理界的主要挑战。在整个CPU表面积的一小部分中,高达1 kW / cm〜2的热通量会产生局部热点,需要对其进行冷却。但是,为最大热通量而设计的散热解决方案过剩地冷却了CPU的其余部分,浪费了资源并创建了较大的芯片上温度梯度。浪费资源显然会对经济和热力学产生负面影响。但是,已经有人提出,大的芯片上温度梯度会降低芯片的可靠性,并增加电路布局的难度。当前的研究提出了一种通过利用珀尔帖效应来增强热量扩散来减少局部热点的策略。珀尔帖效应最常与热电模块的运行有关。在热电模块中,热量通过电子在模块上传输。理想地,用于热电模块的材料将具有非常低的热导率以减少通过热电元件的反向热传导的量,并且电阻率将非常低以最小化焦耳热。使用当今最好的市售热电材料,其热导率,电阻率和塞贝克系数应满足热电模块的COP约为1的要求。这意味着,为了冷却耗散100W的处理器,需要额外消耗100W必须向热电模块供电。然后,散热器和任何建筑物的HVAC系统必须拒绝合计200W。一种更实用的方法是使用珀尔帖效应不对整个CPU进行冷却,而仅对高热通量区域进行冷却。这是通过将热电元件横向放置在CPU的背面来实现的。冷却接点放置在高通量区域附近,而加热接点放置在可容忍额外热量的低热通量区域中与CPU接触,从而有效地创建了有源散热器。与被动式散热相比,此处提出的珀耳帖增强式散热方式可降低局部热点的温度。温度降低的量取决于材料的厚度以及热导率,但显示的值高达50%。

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