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Effect of deposition temperature on the crystalline structure and surface morphology of ZnO films deposited on p-Si

机译:沉积温度对在p-Si上沉积的ZnO薄膜的晶体结构和表面形态的影响

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Abstract: - Zinc oxide (ZnO) films were deposited on p-Si substrates by sol-gel spin coating method. Zinc acetate dihydrate (ZnAc), 2-methoxyethanol and monoethanolamine (MEA) were used as a starting material, solvent and stabilizer, respectively. The films were deposited 500℃, 600℃, 700℃ and 800℃ for 1 h in air. The effects of deposition temperature on the crystallinity and morphological properties of ZnO films were assessed by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM). The important changes in crystalline structure of the films were observed due to the deposition temperature. The crystallite size, texture coefficient and lattice constant of the films have been calculated. The FESEM measurements showed that the number of particles which has hexagonal structure increased with increasing deposition temperature.
机译:摘要:-通过溶胶-凝胶旋涂法将氧化锌(ZnO)膜沉积在p-Si衬底上。二水合醋酸锌(ZnAc),2-甲氧基乙醇和单乙醇胺(MEA)分别用作原料,溶剂和稳定剂。将膜在空气中分别在500℃,600℃,700℃和800℃下沉积1小时。通过X射线衍射(XRD),场发射扫描电子显微镜(FESEM)评估了沉积温度对ZnO膜的结晶度和形貌特性的影响。由于沉积温度,观察到了膜的晶体结构的重要变化。计算了薄膜的微晶尺寸,织构系数和晶格常数。 FESEM测量表明,具有六边形结构的颗粒数目随着沉积温度的升高而增加。

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