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INVESTIGATION OF ZnO:N AND ZnO:(Al,N) FILMS FOR SOLAR DRIVEN HYDROGEN PRODUCTION

机译:用于太阳能制氢的ZnO:N和ZnO:(Al,N)薄膜的研究

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ZnO thin films with significantly reduced bandgaps were synthesized by doping N and co-doping Al and N at 100℃. All the films were synthesized by radio-frequency magnetron sputtering on F-doped tin-oxide-coated glass. We found that co-doped ZnO:(Al,N) thin films exhibited significantly enhanced crystallinity as compared to ZnO doped solely with N, ZnO:N, at the same growth conditions. Furthermore, annealed ZnO:(Al,N) thin films exhibited enhanced N incorporation over ZnO:N films. As a result, ZnO:(Al,N) films exhibited improved photocurrents than ZnO:N films grown with pure N doping.
机译:通过在100℃掺杂N和共掺杂Al和N来合成带隙明显减小的ZnO薄膜。所有的薄膜都是通过射频磁控溅射在掺​​F的氧化锡涂层玻璃上合成的。我们发现,在相同的生长条件下,与仅掺杂N的ZnO:N相比,共掺杂的ZnO:(Al,N)薄膜的结晶度显着提高。此外,退火的ZnO:(Al,N)薄膜比ZnO:N薄膜显示出更高的N掺入。结果,与纯N掺杂生长的ZnO:N膜相比,ZnO:(Al,N)膜表现出改善的光电流。

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