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Comparison of various structures of CMOS photodiodes in terms of dark current, photocurrent and quantum efficiency

机译:在暗电流,光电流和量子效率方面比较CMOS光电二极管的各种结构

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Until now, very few systematic studies have been made for comparing various photodiode structures in terms of their performance characteristics. Most of the studies included only few structures, some of them only simulated, without experimental measurements. Unfortunately, all these studies comprised only a few photodiodes, and in our knowledge there is no extended study to compare all types of CMOS photodiodes, fabricated using various CMOS processes. In this paper we will try to fill in this empty space in this area, in order to provide an easier choice of the most appropriate CMOS photodiode (and thus of the CMOS image sensor) to be used in a certain application, according to the desired characteristics for each situation. We will review some important studies in which essential parameters for the characterization of the CMOS photodiode were evaluated: quantum efficiency, photocurrent and dark current. We consider that this paper will provide a useful reference for choosing the most suitable photodiode and CMOS image sensor for a very large area of applications.
机译:到目前为止,很少有系统的研究来比较各种光电二极管结构的性能特征。大多数研究仅包括很少的结构,其中一些仅是模拟的,没有实验测量。不幸的是,所有这些研究仅包含几个光电二极管,并且据我们所知,没有扩展的研究来比较使用各种CMOS工艺制造的所有类型的CMOS光电二极管。在本文中,我们将尝试填充此区域中的空白区域,以便根据需要提供更容易的选择,以便在特定应用中使用最合适的CMOS光电二极管(从而选择CMOS图像传感器)。每种情况的特征。我们将回顾一些重要的研究,其中评估了CMOS光电二极管表征的基本参数:量子效率,光电流和暗电流。我们认为,本文将为选择非常适合大面积应用的光电二极管和CMOS图像传感器提供有用的参考。

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