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Modelling of realistic annealing behaviour of amorphous silicon photovoltaic devices

机译:非晶硅光伏器件的实际退火行为建模

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Long-term degradation and annealing behaviour of a-Si mini-modules is investigated in this paper. Four devices were firstly degraded by light and then annealed in the dark at temperatures rangingfrom 65-85℃. Dark annealing rates were obtained for each temperature. Further annealing with light bias was carried out for two of the devices in order to study the interaction between thelight-induced degradation and thermal annealing process. Resultsdemonstrate that the annealing in the dark is strongly influenced by the operating temperature but also dependent on thehistory of the devices. Annealing is a self-limiting process and is significantly influenced by the light intensityin the short-term exposure, giving rise for a balance-equation for modelling purposes.
机译:本文研究了非晶硅微型组件的长期降解和退火行为。四个器件首先被光降解,然后在黑暗中于65-85℃的温度下退火。对于每个温度获得暗退火速率。为了研究光致降解和热退火过程之间的相互作用,对其中两个器件进行了带有光偏压的进一步退火。结果表明,黑暗中的退火受工作温度的影响很大,但也取决于器件的历史。退火是一个自我限制的过程,在短期曝光中受光强度的影响很大,因此出于建模目的而产生了一个平衡方程。

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  • 会议地点 Swanaea(GB)
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    Centre for Renewable Energy Systems Technology, School of Electronic, Electrical and System Engineering, Loughborough University, Loughborough, Leicestershire, LE11 3TU, UK;

    Centre for Renewable Energy Systems Technology, School of Electronic, Electrical and System Engineering, Loughborough University, Loughborough, Leicestershire, LE11 3TU, UK;

    Centre for Renewable Energy Systems Technology, School of Electronic, Electrical and System Engineering, Loughborough University, Loughborough, Leicestershire, LE11 3TU, UK;

    Centre for Renewable Energy Systems Technology, School of Electronic, Electrical and System Engineering, Loughborough University, Loughborough, Leicestershire, LE11 3TU, UK;

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