首页> 外文会议>7th Conference amp; Exhibition of the European Ceramic Society Pt.2, Sep 9-13, 2001, Brugge, Belgium >Effects of low-Temperature annealing on the Microstructure and Electrical Properties of doped-ZnO Varistors
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Effects of low-Temperature annealing on the Microstructure and Electrical Properties of doped-ZnO Varistors

机译:低温退火对掺杂ZnO压敏电阻组织和电学性能的影响

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We report in the present paper that fully dense doped-ZnO varistors with submicronic grain size can be fabricated by a strategic two-stage pressureless thermal processing method, at temperatures as low as 825℃in air. Densification in a two-stage sintering is believed to be based on a rapid rearrangement of the solid ZnO nanoparticles in the presence of a liquid phase at the first stage up to 900℃. In the second stage, on cooling at 825℃, the liquid phase recedes improving, thus, ZnO-ZnO direct contacts and suppressing the grain boundary migration while keeping grain boundary diffusion very active to densify. Full density by a close-packed arrangement of the grains was obtained at the second stage for 10h. The current-voltage characteristics of such fully dense varistors were as high as 270 for the non-linear coefficient a, and the breakdown field V_b (at lmA/cm~2) of about 20 kV/ cm.
机译:我们在本文中报道,可以通过战略性的两阶段无压热处理方法,在空气中低至825℃的温度下,制造具有亚微晶粒度的全致密掺杂ZnO压敏电阻。据信两阶段烧结中的致密化是基于固态ZnO纳米粒子在液相存在下在第一阶段(最高900℃)下的快速重排。在第二阶段,在825℃冷却时,液相后退,因此ZnO-ZnO直接接触并抑制了晶界迁移,同时保持了晶界扩散非常活跃地致密化。在第二阶段持续10h,通过密排排列的晶粒获得了全密度。对于非线性系数a,这种完全致密的压敏电阻的电流-电压特性高达270,击穿场V_b(在1mA / cm〜2时)约为20kV / cm。

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