A Hydrogenated Water Application to Semiconductor Manufacturing

摘要

The effect of hydrogenated ullrapure water, especially oxidation suppression on silicon surface with high concentration activated dopants and copper pipeline surface using a cooling water line, on the future device manufacturing was estimated. It reveals an excellent property for suppressing oxidation on their surfaces. This is reason why introduction of hydrogen in ultrapure water allows reduction capability increase of the water, so that it prevents their surfaces from being oxidized. This noble method, based on adding hydrogen gas to ultrapure water is a good candidate for future semiconductor manufacturing.