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Development of ternary iron vanadium oxide semiconductors for applications in photoelectrochemical water oxidation

机译:三元铁钒氧化物半导体在光电化学水氧化中的应用

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Herein, we report the synthesis of Fe-V-oxides via the drop casting of metal precursor solutions in different proportions onto an indium tin oxide (ITO) coated glass followed by annealing in air at 500 degrees C for 3 h. UV-vis spectroscopy of the Fe-V-oxides indicates absorption due to 'direct' and 'indirect' band gaps, although Fe-oxide shows a direct band gap nature. Scanning electron microscopy-energy dispersive X-ray (SEM-EDX) and X-ray diffraction (XRD) studies reveal different surface morphologies with variable crystalline phases for the Fe2O3, FeVO4, FeV2O4 and Fe2VO4 semiconductors. The photoelectrochemical (PEC) water oxidation reaction over the different materials reveals that the FeV2O4 semiconductor exhibits the maximum photocurrent of 0.18 mA cm(2) at an applied bias of + 1.0 V (vs. Ag/AgCl) under the illumination of 100 mW cm(-2) compared to the other Fe2O3, FeVO4 and Fe2VO4 semiconductors. Electrochemical impedance spectroscopic (Mott-Schottky) analysis confirms n-type semiconductivity for all the materials with highest donor density, in the order of 2.7 x 10(20) cm(-3), for the FeV2O4 thin film, and PL spectra are useful for measuring the separation efficiency of the photo-generated charge carriers. Chronoamperometric studies under constant illumination of the best semiconductor (FeV2O4) indicate the significant stability of the material, and photoelectrochemical action spectra demonstrate 22% incident photon to current conversion efficiency (IPCE) and 60% absorbed photon to current conversion efficiency (APCE).
机译:在此,我们通过将金属前体溶液的下降浇铸在不同比例上以不同比例的浇铸浇注到氧化铟锡(ITO)涂覆的玻璃上,然后在500℃下退火3小时。 UV-VIS中的Fe-V-氧化物的光谱显示吸收由于“直接”和“间接”的带隙,虽然铁氧化物示出了直接带隙性质。扫描电子显微镜 - 能量分散X射线(SEM-EDX)和X射线衍射(XRD)研究显示了Fe2O3,FeVO4,FEV2O4和Fe2VO4半导体的可变晶相的不同表面形态。在不同材料上的光电化学(PEC)水氧化反应表明,FEV2O4半导体在100mW厘米的照明下在+ 1.0V(Vs. Ag / AgCl)的施加偏压下显示出0.18 mA cm(2)的最大光电流(-2)与其他FE2O3,FEVO4和FE2VO4半导体相比。电化学阻抗光谱(MOTT-Schottky)分析证实了具有最高供体密度的所有材料的N型半导体,大约为2.7×10(20)cm(-3),对于FEV2O4薄膜,PL光谱是有用的用于测量光产生的电荷载体的分离效率。在最佳半导体(FEV2O4)的恒定照射下的计时率研究表明了材料的显着稳定性,并且光电化学作用光谱将22%的入射光子表现出电流转化效率(IPCE)和60%吸收光子至电流转化效率(APCE)。

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  • 来源
    《RSC Advances》 |2016年第6期|共8页
  • 作者单位

    Indian Inst Engn Sci &

    Technol Dept Chem Howrah 711103 W Bengal India;

    Indian Inst Engn Sci &

    Technol Dept Chem Howrah 711103 W Bengal India;

    Indian Inst Engn Sci &

    Technol Dept Chem Howrah 711103 W Bengal India;

    Indian Inst Engn Sci &

    Technol Dept Chem Howrah 711103 W Bengal India;

    Indian Inst Engn Sci &

    Technol Dept Chem Howrah 711103 W Bengal India;

    Indian Inst Engn Sci &

    Technol Dept Met &

    Mat Engn Howrah 711103 W Bengal India;

    Indian Inst Engn Sci &

    Technol Dept Chem Howrah 711103 W Bengal India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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