Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment

摘要

The efficiency of a new, fast, non-contact photo-thermal cleaning of volatile contamination adsorbed onto silicon wafers is evaluated and a comparison with other conventional cleanings for organics is given. It is shown that the Rapid Optical Surface Treatment (ROST~(TM)) is very effective in organic cleaning without detrimental effects on the treated wafer. ROST is a general final conditioning for metrologies and IC manufacturing steps that are sensitive to hydrocarbon contamination, such as thin film thickness measurement and poly-gate deposition.