Plasma Enhanced Chemical Vapor Deposition (PECVD) on Web Using Novel Linear, High Density Plasma Source

摘要

A novel source technology has been developed that enables large area plasma enhanced chemical vapor deposition (PECVD) for continuous processes such as web coating. The novel source, termed the Plasma Beam Source? (PBS?), has advantages over conventional PECVD sources, such as no electrode coating, high precursor dissociation and no powder formation. The PBS? delivers high deposition rates; for examples SiO_2 at > 1000 nm-m/min and SiN at > 200 nm-m/minrnThis paper reviews the historical progress of the new technology and presents the latest results. Films deposited by PBS? include hard coatings on plastics (SiO_2), barrier films (SiC, SiN), transparent conducting oxide (SnO_2) and photocatalytic films (TiO_2). Property and characterization results for these films are discussed.