首页> 外文会议>4th European Conference on Silicon Carbide and Related Materials (ECSCRM 2002); Sep 2-5, 2002; Linkoeping, Sweden >Electrical and Optical Characterization of p-Type Boron-Doped 6H-SiC Bulk Crystals
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Electrical and Optical Characterization of p-Type Boron-Doped 6H-SiC Bulk Crystals

机译:p型掺硼6H-SiC块状晶体的电学和光学特性

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Electrical and optical characterization was performed to obtain information about the doping and compensation levels of samples cut from boron doped, physical vapor transport (PVT) grown 6H-SiC crystals. Values for NA and ND can be derived from analysis on temperature dependent Hall effect measurement data. The charge carrier concentration p at room temperature depends approximately linearly on N_A/N_D. The below band-gap absorption (BBGA) maximum at about 730 nm is correlated mainly to N_A, and, for constant N_A, is slightly anti-correlated to ND. The same results can be obtained from an α~(1/2) vs. E plot extrapolated to α= 0 in the near band-gap region, as the broad absorption band induces a shift in the optically detected band-gap towards lower energies. Absorption measurements can give an estimation of N_A-N_D in boron doped SiC samples, and from wafers cut from the same crystal, the concentration of boron and compensating impurities can be evaluated.
机译:进行了电学和光学表征,以获得有关从掺硼,物理气相传输(PVT)生长的6H-SiC晶体中切割的样品的掺杂和补偿水平的信息。 NA和ND的值可以从对温度相关的霍尔效应测量数据的分析中得出。室温下的载流子浓度p近似线性地取决于N_A / N_D。在约730nm处的最大带隙以下吸收(BBGA)主要与N_A相关,并且对于恒定的N_A,与ND稍微反相关。从外带隙区域外推至α= 0的α〜(1/2)与E的关系图可以得到相同的结果,因为宽的吸收带会引起光学检测的带隙向较低能量的偏移。吸收测量可以估算掺硼SiC样品中的N_A-N_D,并且可以从由相同晶体切割而成的晶片中评估硼的浓度和补偿性杂质。

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