首页> 外文会议>4th European Conference on Silicon Carbide and Related Materials (ECSCRM 2002); Sep 2-5, 2002; Linkoeping, Sweden >Characterisation of the High Temperature Performance of 4H-SiC Schottky Barrier Diodes
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Characterisation of the High Temperature Performance of 4H-SiC Schottky Barrier Diodes

机译:4H-SiC肖特基势垒二极管高温性能的表征

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摘要

Three approaches to the modelling of the temperature and voltage dependence of the forward and reverse bias characteristics of 4H-SiC Ti Schottky Diodes are compared. 4H-SiC Schottky barrier diodes (SD) were fabricated and subjected to forward and reverse bias I-V characterisation at temperatures ranging from ambient to 300℃. Device parameters (barrier height, ideality factor) and the Richardson constant ― area product (A·A**) were extracted from the forward characteristics using a modified Norde technique. Comparisons were made using extracted parameters for both forward and reverse bias conditions between three models: thermionic emission theory (TE), thermionic emission with barrier lowering (TEBIL) theory and thermionic field emission (TFE) theory. It is found that both TEBIL and TFE can provide a close fit for both forward and reverse conditions from a single set of parameters.
机译:比较了4H-SiC Ti肖特基二极管正向和反向偏置特性对温度和电压依赖性的三种建模方法。制备了4H-SiC肖特基势垒二极管(SD),并在环境温度至300℃的温度下进行正向和反向偏置I-V表征。使用改良的Norde技术从前向特性中提取设备参数(势垒高度,理想因子)和Richardson常数-面积积(A·A **)。使用提取的参数对三个模型之间的正向和反向偏置条件进行了比较:热电子发射理论(TE),带势垒降低的热电子发射(TEBIL)理论和热电子场发射(TFE)理论。已经发现,TEBIL和TFE都可以通过一组参数为正向和反向条件提供紧密的匹配。

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