首页> 外文会议>32nd European Solid-State Device Research Conference (ESSDERC 2002), Sep 24-26, 2002, Firenze, Italy >Precision and Robust CMOS Voltage Reference Based on the Work Function Difference of Poly Si Gate
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Precision and Robust CMOS Voltage Reference Based on the Work Function Difference of Poly Si Gate

机译:基于多晶硅栅功函数差的精密鲁棒CMOS电压基准

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This paper presents a new precision and robustrnCMOS voltage reference consisting of two sets of pairrntransistors: One of the sets has negative temperaturerncoefficient of their threshold voltage difference, whilernthe other positive temperature coefficient. A mainrnfeature of the Voltage Reference is the use of pairrntransistors which ensures the accuracy of the referencerncircuit under process fluctuations. The measured resultsrnrevealed without adjusting trimming that the voltagernreference has (1)excellent reproducibility of the outputrnvoltage within ± 2%, (2)low temperature coefficient ofrnless than 80ppm/℃ and (3)low current consumption ofrn0.6μA.
机译:本文提出了一种由两对晶体管组成的新型精密,鲁棒的CMOS电压基准:其中一组晶体管的阈值电压差为负温度系数,而另一组温度系数为正温度系数。电压基准的主要特点是使用了成对晶体管,可确保在工艺波动下基准电路的精度。无需调整即可显示测量结果,电压基准具有(1)在±2%以内的输出电压具有出色的重现性;(2)低的温度系数小于80ppm /℃;以及(3)的低电流消耗为0.6μA。

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