Nanostructural image modelling for testing of EUV projective objective

机译：用于测试EUV投射物镜的纳米结构图像建模

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The two mirror Schwarzschild objective with NA=0.36 designed for an experimental EUV lithographer has been studied. Test measurements by computer isophotometry method have shown the capability of this objective to resolve the image features with a size of no more than 50 nm at wavelength of 13.4 nm.

机译：研究了为实验EUV光刻机设计的NA = 0.36的两面镜Schwarzschild物镜。通过计算机等光光度法进行的测试测量表明，该物镜具有分辨13.4 nm波长处尺寸不超过50 nm图像特征的能力。

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来源
《2nd EOS conference on manufacturing of optical components 2011》|2011年|p.139-140|共2页
会议地点 Munich(DE);Munich(DE)
作者
A.P.Zhevlakov; O.B.Danilov; E.V.Gavrilov;
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作者单位

Institute for Laser Physics Vavilov State Optical Institute, St-Petersburg, Russia;

Institute for Laser Physics Vavilov State Optical Institute, St-Petersburg, Russia;

Institute for Laser Physics Vavilov State Optical Institute, St-Petersburg, Russia;

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正文语种 eng
中图分类光学仪器;
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入库时间 2022-08-26 13:47:54

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1. Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography [J] . Erdmann A., Shao F., Agudelo V., Journal of Modern Optics . 2011,第5a6期

机译：用于高级光学和EUV光刻的掩模衍射和投影成像建模
2. Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography [J] . Andreas Erdmannab* Feng Shaoab Viviana Agudeloab Tim FÃ¼hnera amp, Peter Evanschitzkya Journal of Modern Optics . 2011,第5a6期

机译：用于高级光学和EUV光刻的掩模衍射和投影成像建模
3. Objective and expert-independent validation of retinal image registration algorithms by a projective imaging distortion model [J] . Sangyeol Lee, Joseph M. Reinhardt, Philippe C. Cattin, Medical image analysis . 2010,第4期

机译：投影成像畸变模型对视网膜图像配准算法进行客观且独立于专家的验证
4. Nanostructural image modelling for testing of EUV projective objective [C] . A.P.Zhevlakov, O.B.Danilov, E.V.Gavrilov EOS conference on manufacturing of optical components . 2011

机译：纳米结构图像建模，用于测试EUV投影目标
5. The solar transition region: High resolution FUV-EUV imaging and modeling of unresolved coronal funnels as observed with the multi-spectral solar telescope array II: MSSTA II, the second flight. [D] . Martinez-Galarce, Dennis Stanley. 2000

机译：太阳过渡区：高分辨率FUV-EUV成像和未解析的日冕漏斗建模，这是通过多光谱太阳望远镜阵列II：MSSTA II进行的第二次飞行。
6. Subjective and objective evaluation of 10–30 dose reduced coronary artery phantom scans reconstructed with Forward projected model-based Iterative Reconstruction SoluTion (FIRST) [O] . Eriko Maeda, Nobuo Tomizawa, Shigeaki Kanno, 2017

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7. Fabrication and testing of optics for EUV projection lithography [O] . John S. Taylor, Gary E. Sommargren, Donald W. Sweeney, 1998

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8. SEMATECH High-NA Actinic Reticle Review Project (SHARP) EUV Mask-Imaging Microscope. [R] . Mochi, I., Benk, M. P., Lin, C., 2013

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Nanostructural image modelling for testing of EUV projective objective

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