Fabrication and testing of optics for EUV projection lithography

机译：EUV投影光刻光学的制造和测试

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John S. Taylor; Gary E. Sommargren; Donald W. Sweeney; Russell M. Hudyma;
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年度 1998
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专利

1. EUV LITHOGRAPHY: High-NA EUV optics are on their way [J] . John Wallace Laser Focus World: The Magazine for the Photonics & Optoelectronics Industry . 2013,第7期

机译：EUV光刻：高NA EUV光学器件正在发展中
2. Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Japanese journal of applied physics . 2019,第SD期

机译：使用DDR工艺制造高纵横比透射光栅，以通过EUV干涉光刻技术评估10 nm EUV抗蚀剂
3. Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography [J] . Yoshifuji Mana, Niihara Shota, Harada Tetsuo, Japanese journal of applied physics . 2019,第SD期

机译：使用DDR工艺制造高纵横比传动光栅10nm EUV抗蚀剂评估通过EUV干扰光刻
4. The Fabrication and Testing of Optics for EUV Projection Lithography [C] . John S.Taylor, Gary E.Sommargren, Donald W.Sweeney, Annual meeting on American Society for Precision Engineering . 1998

机译：EUV投影光刻的光学元件的制造和测试
5. Gibbsian segregating alloys driven by thermal and concentration gradients: A potential grazing collector optics used in EUV lithography. [D] . Qiu, Huatan. 2007

机译：由温度和浓度梯度驱动的吉布斯偏析合金：EUV光刻中潜在的掠射收集器光学器件。
6. Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography [O] . Qinyuan Deng, Yong Yang, Hongtao Gao, 2017

机译：基于一步法无掩模灰度光刻的具有任意表面轮廓的微光学元件的制备
7. Novel condenser for EUV lithography ring-field projection optics [O] . Henry N. Chapman, Keith A. Nugent 1999

机译：<标题> EUV光刻环形投影光学元件的新型冷凝器
8. Fabrication and testing of optics for EUV projection lithography [R] . Taylor, J. 1998

机译：用于EUV投影光刻的光学器件的制造和测试

Fabrication and testing of optics for EUV projection lithography

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