首页> 外文会议>26th International Symposium for Testing and Failure Analysis, Nov 12-16, 2000, Bellevue, Washington >EOS Simulation and Failure Analysis of Metallurgically Bonded Silicon Diodes
【24h】

EOS Simulation and Failure Analysis of Metallurgically Bonded Silicon Diodes

机译:冶金结合硅二极管的EOS仿真和失效分析

获取原文
获取原文并翻译 | 示例

摘要

Metallurgically bonded, glass-bodied DO-35 power rectifier diodes were electrically overstressed by applying forward and reverse current pulses. Forward current pulses varied from 0.1 to 3 ms with current amplitudes varying from 200 to 1000 A were applied to one group of diodes. Reverse bias current pulses in the microsecond range with amplitudes from 2 to 400 mA (above breakdown voltage) were applied to another group. A small-step cross sectioning in combination with electrical probing, light emission microscopy, liquid crystal technique, and chemical staining were used to reveal and compare damage in three groups of diodes: two overstressed groups and the third group which had failed during burn-in electrical testing. Failure mechanisms and peculiarities of damage created in these diodes and several case histories related to different types of diodes are discussed.
机译:通过施加正向和反向电流脉冲,使冶金结合的玻璃体DO-35功率整流器二极管电气过应力。将正向电流脉冲从0.1到3 ms变化,电流幅度从200到1000 A变化到一组二极管。将微秒级的反向偏置电流脉冲(振幅在2到400 mA(击穿电压以上))施加到另一组。将小步横截面与电探测,发光显微镜,液晶技术和化学染色相结合,用于揭示和比较三组二极管的损坏:两个过应力组和第三组在老化过程中失效的二极管电气测试。讨论了在这些二极管中产生的故障机制和损坏的特殊性,以及与不同类型的二极管相关的几种案例历史。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号