首页> 外文会议>26th International Symposium for Testing and Failure Analysis, Nov 12-16, 2000, Bellevue, Washington >New Laser Ablation Method for Non-Destructive Backside Sample Preparation
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New Laser Ablation Method for Non-Destructive Backside Sample Preparation

机译:用于无损背面样品制备的新激光烧蚀方法

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摘要

A new ultra-short pulse laser ablation based backside sample preparation method has been developed. This technique is contact-less, non-thermal, precise, repetitive and adapted to each type of material present in IC packages. Backside preparation examples are presented on a conventional DIL plastic package, on a TSOP plastic package with an oversized silicon die, on a DIL ceramic package and on a CCD device. Feasibility of silicon thinning using laser ablation is also discussed.
机译:开发了一种基于超短脉冲激光烧蚀的背面样品制备方法。这种技术是非接触的,非热的,精确的,可重复的,并且适用于IC封装中存在的每种材料。在传统的DIL塑料封装,带有超大硅芯片的TSOP塑料封装,DIL陶瓷封装和CCD器件上提供了背面制备示例。还讨论了使用激光烧蚀来减薄硅的可行性。

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