首页> 外文会议>21st International Conference on Defects in Semiconductors (ICDS-21) Jul 16-20, 2001 Giessen, Germany >Illumination effects in irradiated 6H n-type SiC observed by positron annihilation spectroscopy
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Illumination effects in irradiated 6H n-type SiC observed by positron annihilation spectroscopy

机译:正电子an没光谱法观察辐照的6H n型SiC的照明效果

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In the present study, we used positron annihilation spectroscopy to investigate defects after electron irradiation in 6H n-type SiC. The density of vacancy-type defects strongly increased during this treatment. An isochronal annealing experiment was performed, and the main recovery stage was found to be between 1000℃ and 1400℃. This corresponds to the annealing range of the E_1/E_2 defect, which was also found by a correlated positron and DLTS study in 6H―SiC epilayers after electron irradiation (J. Appl. Phys. 80 (1996) 5639). Optical excitation experiments during the positron experiment show that the observed defect has an ionization level at about E_c― 0.47eV, which is similar to the level E_c―0.44eV obtained by DLTS for the E_1/E_2 defect (Appl. Phys. Lett. 74 (1999) 839). Doppler-coincidence experiments suggest that the observed vacancy is surrounded by C atoms, so that most probably the Si vacancy (isolated or bound to an impurity or another defect) is the dominating defect after electron irradiation.
机译:在本研究中,我们使用正电子an没光谱法研究了6H n型SiC中电子辐照后的缺陷。在这种处理过程中,空位型缺陷的密度大大增加。进行了等时退火实验,发现其主要恢复阶段在1000℃至1400℃之间。这对应于E_1 / E_2缺陷的退火范围,该范围也通过电子辐照后在6H-SiC外延层中进行的正电子和DLTS的相关研究发现(J. Appl。Phys。80(1996)5639)。在正电子实验中的光激发实验表明,观察到的缺陷的电离能级约为E_c- 0.47eV,这与DLTS针对E_1 / E_2缺陷获得的电离能级E_c-0.44eV相似(应用物理函授74 (1999)839)。多普勒符合实验表明,所观察到的空位被C原子包围,因此,硅空位(隔离或结合到杂质或另一缺陷上)很可能是电子辐照后的主要缺陷。

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