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Double-Gate FDSOI Based SRAM Bitcell Circuit Designs with Different Back-Gate Biasing Configurations

机译:具有不同背栅偏置配置的基于双门FDSOI的SRAM位单元电路设计

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摘要

Power saving techniques have become essential for modern digital systems. Large on-chip SRAM memories are used in these systems and therefore it is necessary to optimize SRAM bitcell circuit to minimize the power consumption. In addition to this, it is equally important to design SRAM cell with high reliability and stability. Power gating technique with sleep transistor if applied to SRAM cell will degrade the performance of the cell. In this paper, Fully Depleted Silicon-on-Insulator (FDSOI) device based SRAM designs are proposed which eliminate the requirement of sleep transistors to reduce the power consumption. This reduces overall complexity and overheads of power gating memory designs. Based on this approach seven SRAM bitcell configurations are presented in the paper. Performance metrics of different SRAM configurations are evaluated and compared in HSPICE.
机译:节能技术已成为现代数字系统必不可少的技术。在这些系统中使用了大型片上SRAM存储器,因此有必要优化SRAM位单元电路以最大程度地降低功耗。除此之外,设计具有高可靠性和稳定性的SRAM单元同样重要。如果将睡眠晶体管的功率门控技术应用于SRAM单元,则会降低其性能。本文提出了一种基于全耗尽型绝缘体上硅(FDSOI)器件的SRAM设计,该设计消除了对睡眠晶体管的需求,从而降低了功耗。这降低了电源门控存储器设计的整体复杂性和开销。基于这种方法,本文提出了七个SRAM位单元配置。在HSPICE中评估并比较了不同SRAM配置的性能指标。

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