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Temperature based performance analysis of doping-less tunnel field effect transistor

机译:无掺杂隧道场效应晶体管的基于温度的性能分析

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摘要

Recently, the doping-less Tunnel Field Effect Transistor (TFET) has emerged as a novel device for the replacement of conventional TFET due to its similar trend in current characteristics and reduced fabrication complexity with low cost. However, the impact of temperature on its performance is yet an undiscovered aspect. The semiconductor devices are known to have significant temperature dependence characteristics. Thus, it is very much of importance to analyse the behavior of the device at different temperature. In this concern, an extensive study has been performed for temperature sensitivity analysis of the behavior of the doping-less TFET. For this, transfer characteristics, energy band diagram and carrier concentration are considered as DC figure of merits, whereas Transconductance (gm), gate-to-drain capacitance (Cgd)), cut off frequency (fT) and gain bandwidth product (GBW) are used as RF performance parameters. Further, the effect of variation in temperature on the Off-state and its components such as Band to Band Tunneling (BTBT), Trap Assisted Tunneling (TAT) and Shockley-Read-Hall (SRH) is also analyzed with different drainchannel spacer widths for doping-less TFET. All the simulations have been performed on Silvaco ATLAS simulator.
机译:近来,由于无掺杂隧道场效应晶体管(TFET)的电流特性趋势相似并且以低成本降低了制造复杂性,因此已经成为替代传统TFET的新型器件。但是,温度对其性能的影响尚未发现。已知半导体器件具有显着的温度依赖性特性。因此,分析设备在不同温度下的行为非常重要。考虑到这一点,已经进行了广泛的研究,以分析无掺杂TFET的行为的温度敏感性。为此,将传输特性,能带图和载流子浓度视为直流的优缺点,而跨导(gm),栅漏电容(Cgd)),截止频率(fT)和增益带宽积(GBW)用作RF性能参数。此外,还分析了温度变化对截止状态及其组成的影响,例如带到带隧道(BTBT),陷阱辅助隧穿(TAT)和肖克利阅读大厅(SRH),并且使用了不同的漏极沟道间隔宽度无掺杂TFET。所有仿真均在Silvaco ATLAS模拟器上进行。

著录项

  • 来源
  • 会议地点 Indore(IN)
  • 作者单位

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

    Nanoelectronics and VLSI Laboratory, Electronics and Communication Engineering Discipline, PDPM-Indian Institute of Information Technology, Jabalpur, 482005, India;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    TFETs; Plasma temperature; Temperature; Silicon; Logic gates; Tunneling; Temperature sensors;

    机译:TFET;等离子温度;温度;硅;逻辑门;隧道;温度传感器;;
  • 入库时间 2022-08-26 14:31:58

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