Jamia Millia Islamia, Electronics and Communications Engineering Department, New Delhi, 110025, India;
Jamia Millia Islamia, Electronics and Communications Engineering Department, New Delhi, 110025, India;
Electrical Engineering Department, Faculty of Engineering, AlJouf University, Sakaka, 42421, Saudi Arabia;
Department of Computer Science, Kirkuk University, Iraq;
Gallium nitride; Aluminum gallium nitride; Wide band gap semiconductors; Aluminum nitride; III-V semiconductor materials; Logic gates; Doping;
机译:基于GaN的阶梯掺杂超结CAVET的研究,以进一步改善击穿电压和特定的导通电阻
机译:以注入了镁离子的GaN作为电流阻挡层的增强和耗尽模式AlGaN / GaN CAVET
机译:氟化物基等离子体处理的增强型击穿电压具有增强模式的Al_2O_3 / InAlN / AlN / GaN金属绝缘体半导体高电子迁移率晶体管
机译:偏振工程增强模式高击穿电压GaN Cavet
机译:GaN中的偏振工程垂直隧道设备
机译:关于碳掺杂GaN中供体/受体补偿比的建模在横向GaN功率Hemts中的单一再现击穿电压和电流塌陷
机译:关于碳掺杂GaN中供体/受体补偿比的建模,在横向GaN功率Hemts中的单一再现击穿电压和电流塌陷