Plasma erosion behavior of yttrium oxide film formed by aerosol deposition method

摘要

Aerosol deposition (AD) method is technique for forming high-density ceramic films on substrate material surface at ambient temperature. The YO film formed by AD method has high density and nanocrystalline structure that crystallite size is under 20 nm. AD YO film has been used for plasma resistance coating and has helped to reduce the generation of particles in plasma etching process. We investigated plasma erosion behavior of AD YO film compared with dense sintered YO bulk. There was obviously difference in surface roughness after plasma erosion between AD YO film and sintered YO bulk. The sintered YO bulk was observed grain boundary erosion that was not observed in AD YO film. The difference of erosion behavior between AD YO film and sintered YO bulk suggests that the particle size generated from AD YO film in the plasma process is much smaller than sintered YO bulk.